MinKi Choe
Chemical Engineering Master’s Candidate Specializing In Thin Film Transistor Technology
4-219, 100, Inha-ro, Michuhol-gu, Incheon
Summary
I am currently conducting research on P-type oxide semiconductors (SnO, Te) used in thin film transistors. My focus is particularly on interface engineering to enhance device characteristics. I have extensive experience in setting up various semiconductor equipment and conducting research using numerous analytical tools.
Overview
3
3
years of professional experience
Work History
Research Student
Inha University
2 2023 - Current
- Leader of the SEMICONDUCTING THIN-FILM ENGINEERING LAB, Developed high performance P type thin film transistor for M3D application
Research Intern
Inha University
12.2021 - 03.2022
- Member of the Computational Catalysis and Energy Materials
Design Laboratory, Development of high-efficiency catalysts for the Oxygen Evolution Reaction (OER) using DFT calculations
Education
Master's Degree - Chemistry, Chemical Engineering
Inha University
Michuhol-gu, Incheon, Republic Of Korea 04.2001 -
Bachelors Degree - Chemical Engineering
Inha University
Michuhol-gu, Incheon, Republic Of Korea 04.2001 -
Skills
Expertise in TFT Device Mechanics: Thorough understanding of Thin Film Transistor (TFT) operating mechanisms and capable of conducting research to enhance device performance
Proficient in Semiconductor Equipment Operation: Experienced with a wide range of tools including Atomic Layer Deposition (ALD), Sputtering, Photolithography, DC Analyzers, and more
Laboratory Leadership Experience: Served as the leader of the Semiconducting Thin-Film Engineering Lab, taking a leading role in lab setup and management
Technical Writing Abilities: Proficient in drafting patents and writing scholarly articles for publication
Research
- P-type 2D materials (SnO, Te)
- N-type materials (MoS2, IGZO)
- Thin film transistors for future DRAM application
- Interface engineering (TFTs Channel/Dielectric interface, Control of channel surface characteristics)
- Intrinsic electrical characteristics of thin film transistor channels (Excluding the influence of Source/Drain contacts)
Equipment Proficiency
- Furnace type ALD (Responsible for setting up this equipment.)
- DC/RF magnetron sputter (Responsible for setting up this equipment.)
- DC parameter analyzer (Responsible for setting up this equipment and developing software.)
- LCR meter (Responsible for setting up this equipment)
- Plasma ion deposition equipment (Surface treatment, Responsible for setting up this equipment)
- MA6
- Reactive ion etcher (Experience in filing a patent using this equipment)
- Ellipsometer
- Spin coater
- Analysis tools (XPS, XRD, TEM, RAMAN...)
List of Presentations
- Dielectric Engineering for High-Performance Top Gate SnO Thin-Film Transistors toward Vertically Stacked Complementary Inverters, 01/24/24~01/26/24, KCS 2024, Poster presentation
- Reduction of Hysteresis in Top-Gate SnO Thin Film Transistors using an Al2O3 Interlayer, 04/24/24~04/27/24, 2024 KIChE Fall Meeting and International Symposium, Oral presentation
Publications
Journal Paper, Recent progress of the p-type oxide thin films for transistor applications: Nickel oxide, Tin oxide, and Copper oxide, Ceramist, Vol.26, No.1, 2023, MinKi Choe
Patents
PMOS semiconductor device, CMOS semiconductor device having the same, and manufacturing thereof, 10-2023-0181632, 2023
Address
School adress : 4-219, 100, Inha-ro, Michuhol-gu, Incheon, Republic of Korea
Current Residence Address : Suite 201 97-1, Inha-ro, Michuhol-gu, Incheon, Republic of Korea
Registered Address : Unit 2303, Building 204, 17, Gobong-ro 278beon-gil, Ilsandong-gu, Goyang-si, Gyeonggi-do, Republic of Korea
Personal Information
- Place of Birth: 102-20, Dongguk-ro 245beon-gil, Ilsandong-gu, Goyang-si, Gyeonggi-do, Republic of Korea
- Date of Birth: 10/06/1997
- Gender: Male
- Nationality: Republic Of Korea
- Passport Number: M790Y8675 (Republic Of Korea, Date of expiry: 2034.07.17)
- Personal email : cmk4154@gmail.com
- School Landline Number : +82) 32-860-7460
Timeline
Research Intern
Inha University
12.2021 - 03.2022
Master's Degree - Chemistry, Chemical Engineering
Inha University
04.2001 -
Bachelors Degree - Chemical Engineering
Inha University
04.2001 -
Research Student
Inha University
2 2023 - Current
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