Seunghyun Kim
Incheon
Summary
Forward-thinking Process Engineer with more than years of experience in process design and establishing manufacturing routines. Known for great time management, effective multitasking and detail-oriented planning. Innovative Researcher adept at developing probing questions, designing experiments and generating meaningful results. Experienced at identifying and using new technologies and resources. Works effectively and collaboratively with teams and individuals.
Overview
2
2
years of professional experience
13
13
years of post-secondary education
Work History
Development of etch gas for Co interconnect dry etching and dry etching process of Co thin films
Inha University
04.2022 - 12.2023
- Project collaborated with Government (Korea Planning and Evaluation Institute of Industrial Technology, KEIT), and Industry (Samsung electronics and SK-hynix)
- Research on surface treatment using simulation method (DFT simulation, VASP).
Novel process development of fine Cu metal dry etch for large area
Inha University
03.2022 - 12.2023
- Project collaborated with LG Display
- Cu etching for applying the process of display interconnect.
PBL Oriented, Semiconductor Materials Equipment, Academic degree course, Training, Human Resource
Inha University
03.2022 - 02.2023
- Research project from Korea Institute for Advancement of Technology, KIAT
- In charge of Cu etching project
- Collaboration with Nanotechplanet (NTP) company about Cu etching process
- ICPRIE and ALE of Cu thin films.
Development of non-green etch gas for Cu dry etching and dry etching process of Cu thin films
Inha University
3 2021 - 12.2021
- Project collaborated with Government (Korea Planning and Evaluation Institute of Industrial Technology, KEIT), and Industry (Samsung electronics and SK-hynix)
- Inductively coupled plasma reactive ion etching (ICPRIE), and atomic layer etching (ALE) about Cu thin films on Ti/Si surface for interconnect layer of semiconductor device
- Graduation theme research of master's degree.
Education
B.S. -
Kumoh National Institute of Technology
03.2011 - 02.2021
M.S. -
Inha University
03.2021 - 02.2024
Ph.D -
Inha University
03.2024 - Current
Skills
VASP 544
Finding energies, and other thermal dynamic values with DFT simulation Based on Linux operation system, Ubuntu 2004 Using surface environment of inorganic materials (My weakness) MD simulation applicable with program but not applicable for my ability (Con) Impossible to use GPU, possible to increase calculation speed
TmolX
Finding energies of organic materials including HOMO-LUMO energy, and Orbital distribution Based on Windows operation system Using surface environment of inorganic materials More method than Gaussian Easy to draw molecular structures
Gaussian
Finding energies of organic materials about orbital distribution Based on Windows operation system Difficult to draw molecular structure comparing to TmolX
Materials studio 2020
Drawing surfaces comprised with inorganic materials with/without organic materials Making cif files to transform POSCAR used to calculate in VASP 544
Research
- Interconnect materials etching
- Master's degree, Atomic layer etching Cyclic etching method of interconnect metal thin films, 2024
- Personal, effect1221@inha.edu
- Personal, seunghyun3.kim@gmail.com
Visa
Nothing now / Requisition status for acquirement J1 Visa
Sex
Male
Department
Materials Science and Engineering
Supervisor
Prof. Jeong-hwan Lee
School address
5N-246A, Inha University, Incheon, Republic of Korea, 22212
Passportno
M16315120
Passport expiry date
02/18/29
Patents
South Korea, Cyclic etching method of interconnect metal thin films, 10-2022-0110490, 2022
Honors and awards
Undergraduate, Silver Prize at KIT Engineering Fair, 2020, with the research of electrospinning using Poly-lactic acid
Personal Information
- Place of Birth: Donghae-si, Gangwon-do, Republic of Korea
- Date of Birth: 12/21/92
- Nationality: Korean
Equipment
- Etcher, ICPRIE etcher including the function of pulse-modulation of DC-bias voltage and atomic layer etching
- FE-SEM, Hitachi S-4300, Hitachi S-4300 SE
- HR-SEM, Hitachi SU 8010
Publications
Journal Paper, Two-Step Cyclic Etching of Copper Thin Films Using Acetylacetone/O2 Gases, ECS Journal of Solid State Science and Technology, Vol.12, 074010, 2023
Conferences
- International, AVS 2022 fall meeting Layer-by-layer etching of copper thin films under acetylacetone/O2 Gas Mixture, 2022
- International, KISM 2022 Layer-By-Layer Etching of Copper Thin Films Using Organic Chelator/O2 gas and Ar plasma, 2022
- International, IUMRS-ICA 2021 Atomic Layer Etching of Nanometer-Scale Patterned Cu Thin Films Using Chelation with Organic Gas, 2021
- South Korea, KEIEC Spring 2022 Layer-by-Layer Etching of Copper Thin Films Using Acetylacetone/O2/Ar Gas Mixture, 2022
- South Korea, KCS 2022 Cyclic Etching of Copper Thin Films Using Organic Compound/O2/Ar Gas, 2022
Industrial experiences
LG Electronics India Pvt Ltd (Mar 2019 - Feb 2020)
Quality Assurance (QA) Activities as an internship at QA Department in Manufacturing Corporate Office
- Contribution on Process of Quality Assurance
- Supporting Refrigerator ILO to improve REF line
- Supporting Washing Machine DQA about Acquiring Energy efficiency in India
- Supporting Compressor ILO Audit to get A Grade from Production Quality Audit Team of HQ
- Supporting task for hand-carry of parts due to factory shortage of part using at Refrigerator
- Supporting Gas leakage Audit
- Supporting RAC supplier activities about parts and process
- Saving all supporting part and product Quality document from Korean to English
Timeline
Ph.D -
Inha University
03.2024 - Current
Development of etch gas for Co interconnect dry etching and dry etching process of Co thin films
Inha University
04.2022 - 12.2023
Novel process development of fine Cu metal dry etch for large area
Inha University
03.2022 - 12.2023
PBL Oriented, Semiconductor Materials Equipment, Academic degree course, Training, Human Resource
Inha University
03.2022 - 02.2023
M.S. -
Inha University
03.2021 - 02.2024
B.S. -
Kumoh National Institute of Technology
03.2011 - 02.2021
Development of non-green etch gas for Cu dry etching and dry etching process of Cu thin films
Inha University
3 2021 - 12.2021